Close-packed silane nanodot arrays by capillary nanostamping coupled with heterocyclic silane ring opening

Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmas

A detailed chemical kinetics mechanism was developed to model silicon oxide clustering during high density plasma chemical vapor deposition of SiO2 films from silane-oxygen–argon mixtures. An inductively coupled plasma reactor was modeled in a one-dimensional multicomponent two-temperature framework. Spatial distributions of species concentrations were calculated. The effects of discharge param...

[Silane coupling agents].

Trimeth­yl(triphenyl­meth­oxy)silane

In the title mol-ecule, C(22)H(24)OSi, the Si-O-C angle is 139.79 (11)°, the O-C-C angles of the triphenyl-meth-oxy group are in the range 106.13 (13)-109.22 (14)° and the O-Si-C angles of the trimethyl-sil-yloxy group are in the range 103.08 (10)-113.53 (10)°. In the crystal, face-to-face π-π interactions are observed between the phenyl rings [centroid separation = 4.194 (1) Å, interplanar spa...

Tetra­kis(4-tert-butyl­benz­yl)silane

The title compound, C(44)H(60)Si, was prepared as an inter-nal standard for diffusion-ordered NMR spectroscopy. The Si atom lies on a special position with site symmetry.

Pressure-induced metallization of silane.

There is a great interest in electronic transitions in hydrogen-rich materials under extreme conditions. It has been recently suggested that the group IVa hydrides such as methane (CH(4)), silane (SiH(4)), and germane (GeH(4)) become metallic at far lower pressures than pure hydrogen at equivalent densities because the hydrogen is chemically compressed in group IVa hydride compounds. Here we re...